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SSEC makes single wafer wet processing affordable for high volume wafer manufacturing. The SSEC 3305/6, our newest processor, is fitted with four FOUP openers and eight single wafer process modules, resulting in high production performance—to 200 wafers per hour. It may be equipped for FEOL or BEOL cleans, for removal of chemical and particle contamination. The SSEC 3305/6 may be configured for either high speed, parallel processing or complex, multi-step serial processing, utilizing standard, production-proven processing modules.

The molded Halar single wafer processing modules in SSEC 3300 systems are configurable with up to seven dispense arms and four chemical drains.  The dispense arms may be fitted with high velocity sprays, megasonic scrubs, PVA brush assemblies, chemistry application nozzles, and more. The system includes onboard chemistry management, with recipe-driven, closed-loop controlled chemistry blending and true single wafer, on-the-fly temperature control. For many applications, in-situ, adaptive process control is provided by SSEC’s exclusive WaferChek™ system, which manages the wet chemistry processing by the optical properties of the wafer surface.

The Windows®-based, object-oriented software provides a convenient user interface, and supports complete management of processing and data logging.

Processes may be serial, with wet wafer transfer, or in parallel, depending on the requirements. The robotic handling system provides up to four blades per handler. These blades can be used for carrying wet wafers between processing steps, or a blade can be dedicated to movement of finished, dry wafers.

The SSEC 3305/6 is designed with up to three robots, to provide safe and contamination-free wafer transport. Edge grip handling, with feedback sensors, vacuum paddles, wafer flipping/reversing, and vision processing all support the cleanest, most reliable individual handling of your valuable wafers. All systems are SEMI® S2-0703aE safety and S8-0705 ergonomic compliant, CE marked, and ETL listed.